Micro structuring flexibility is the fundamental requirement of the Australian National Fabrication Facility (ANFF) node based at the University of South Australia (UniSA). Their open-access facility specialises in microfluidics, organic electronics, biomaterials and novel semiconduction characterisation.
UniSA required direct laser writing capability on the micron scale to support their academic and industrial research base.
An extensive evaluation of the lithography machines available led the ANFF group to choose the direct laser writing and high aspect ratio capability of the Kloe DiLase 650 for their requirements.
The dual laser and dual wavelengths of the Kloe direct-write UV technology allow for the selection of beam sizes from 0.5 microns to 100 microns in a range of different photoresists. This flexibility is the principal reason they chose the laser machine.
The Australian National Fabrication Facility (ANFF)-SA node routinely uses its Raymax supplied Kloe Dilase 650 system. The flexibility is offered in different photoresists and dual wavelength. Varying beam sizes from 0.5 microns to 100 microns then support cutting-edge research conducted within the University of South Australia. ANFF is pleased with the continued relationships with Raymax and Kloe.
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